Beam alignment for scanning beam interference lithography

نویسندگان

  • Carl G. Chen
  • Ralf K. Heilmann
  • Chulmin Joo
  • Paul T. Konkola
  • G. S. Pati
  • Mark L. Schattenburg
چکیده

By interfering two small diameter Gaussian laser beams, scanning beam interference lithography ~SBIL! is capable of patterning linear gratings and grids in resist while controlling their spatial phase distortions to the nanometer level. Our tool has a patterning area that is up to 300 mm in diameter. The motive for developing SBIL is to provide the semiconductor industry with a set of absolute metrology standards, but the technology is easily adaptable to other important applications such as the making of high precision optical encoders. In this article, we describe a system for carrying out automated beam alignment for SBIL. Our design goals require tight alignment tolerances, where beam position and angle alignment errors must be controlled to ;10 mm and ;10 mrad, respectively. We describe our system setup, and discuss the so-called iterative beam alignment principle, focusing specifically on deriving a mathematical formalism that can guide the development of similar systems in the future. Repeatability experiments demonstrate that our system fulfills the alignment requirements for nanometer-level SBIL writing. © 2002 American Vacuum Society. @DOI: 10.1116/1.1523402#

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Three-beam interference lithography methodology.

Three-beam interference lithography represents a technology capable of producing two-dimensional periodic structures for applications such as micro- and nanoelectronics, photonic crystal devices, metamaterial devices, biomedical structures, and subwavelength optical elements. In the present work, a systematic methodology for implementing optimized three-beam interference lithography is presente...

متن کامل

Doppler writing and linewidth control for scanning beam interference lithography

Scanning beam interference lithography SBIL is a technique which is used to create large-area periodic patterns with high phase accuracy. This is accomplished by combining interference lithography and an X-Y scanning stage. We previously reported parallel scan mode in which the stage scans in a direction parallel to the interference fringes. Here we present a method called Doppler scanning. In ...

متن کامل

Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography

We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while th...

متن کامل

Effects of beam pointing instability on two-beam interferometric lithography

In a photolithographic system, the mask patterns are imaged through a set of lenses on a resist-coated wafer. The image of mask patterns physically can be viewed as the interference of the plane waves of the diffraction spectrum captured by the lens set incident on the wafer plane at a spectrum of angles. Two-beam interference fringe is the simplest format of the image. Consequently, two-beam i...

متن کامل

Fabrication of optical negative-index metamaterials: Recent advances and outlook

A status report on optical negative-index-metamaterial fabrication is given. The advantages, drawbacks and challenges of different fabrication techniques including electron-beam lithography (EBL), focused-ion beam (FIB) milling, interference lithography (IL) and nanoimprint lithography (NIL) and direct laser writing are outlined. Since the possibility of creating a truly three-dimensional (3D) ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2002